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1. FEATURES AND USES
NEOPAN 100 ACROSII is a medium-speed, ultrahigh-image-
quality black-and-white negative film that boasts the world’s
highest standard in grain quality among ISO-100 films, rich
gradation and outstanding sharpness. These features make it
an excellent choice for a wide range of photographic applica-
tions, including portraits, landscape, architectural subjects,
product photography, photomicrography, duplication work and
astrophotography.
Worlds Highest Standard in Grain Quality
Through the incorporation of Fujifilm’s new proprietary
Super
Fine-Σ Grain Technology, this film delivers the
world’s highest
standard in grain quality among ISO-100 black-and-
white films.
Its fine grain, along with its superb grain alignment and rich gr
a-
dation, makes possible smoother and sharper
textural depiction,
even in big enlargements.
Excellent Processing Characteristics
By incorporating the newly developed P.I.D.C.
(Precision Iodine
Distribution Control) Technology”, NEOPAN 100 ACROSII pr
o-
vides stable processing results not only during manual pr
o-
cessing with all
kinds of developers and fixers, but in every type
of automatic processor as well.
Improved Reciprocity Characteristics
This film exhibits extremely minimal reduction in sensitivity
even
in extended, low-light exposures, thus prod
ucing excellent results
in astronomical photography and night scenes, as well as arch
i-
tecture and other subjects requiring long exposures.
2. SPEED
ISO100/21°
3. COLOR SENSITIVITY
Orthopanchromatic
4.
FILM SIZES, BASE MATERIAL AND THICKNESS
135……36-exp. (with patrone)
Thickness: 0.134mm
TAC (Cellulose Triacetate), Gray base
5. EXPOSURE GUIDE
Use an exposure meter for exposure determination. If a meter
is not available, refer to the following table.
Light
Conditions
Seashore
or Snow
Scenes
under
Bright
Sun
Bright
Sunlight
Hazy
Sunlight
Cloudy
Bright
Cloudy
Day or
Open
Shade
Lens
Aperture
f/16 f/11 f/8 f/8 f/5.6
Shutter
Speed
(sec.)
1/250 1/250 1/250 1/125 1/125
Reciprocity Characteristics
No exposure compensation is required for exposures at
shutter speeds of less than 120 seconds. However, for ex-
posures of 120 seconds or longer, provide the compensation
indicated below.
Exposure Time (sec.)
120 - 1000
Exposure Corrections*
+1/2
* A “+ followed by a number indicates the required increase in lens opening.
The use of an exposure meter is recommended, especially
for indoor photography due to the wide variation in brightness
levels that may be encountered. Use of a tripod or other
means of stabilizing the camera is recommended for expo-
sures at shutter speeds of less than 1/100 second
Flash Exposure
Shutter Speed
When electronic flash exposures are to be made, the shutter
speed for cameras with a focal-plane shutter should be set in
accordance with the camera instructions. In the case of
lens-shutter cameras (such as compact cameras, certain
medium-format cameras and studio cameras), the shutter
speed can be varied.
Lens Aperture
The following formula can be used to obtain satisfactory lens
opening.
NEOPAN
100 ACROSII (135)
NEOPAN
100 ACROS
II
(135)
AF3-0258E
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Lens
Aperture =
(f-number)
When an automatic electronic flash unit is employed, set the
film speed at ISO 100. Since the amount of light reflected
onto subjects from surrounding surfaces will differ with the
conditions, refer to the flash unit instructions.
Filter Recommendations
When a filter is to be used, multiply the normal exposure by a
proper filter factor using the table below as a guide.
Filter
Fuji Filter
SC-39
(UV)
SC-48
(yellow)
SC-56
(orange)
SC-60
(red)
Wratten Filter No.1A No.8 No.21 No.25
Filter
Factor
Daylight 1.0 2.0 4.0 8.0
Tungsten 1.0 1.5 3.0 6.0
6. SAFELIGHT
Handle the film in total darkness. If a safelight must be used, a
Fuji Safelight Filter SLG-4* (dark green) with a20 watt bulb may
be used at a distance not less than 1meter (3.3 ft.). In such
cases, use the safelight for as short a period as possible and
only towards the end of the development period.
7. PROCESSING
(1) Development
To prevent the appearance of development marks and as-
sure uniform finish, agitate the developer continuously for the
first minute and for five seconds every minute thereafter.
Development Conditions (Small Tank Development)
The following table shows development times and tempera-
tures for each developer.
Unit: minutes
Developer
Temp.
EI
*
18°C
(64°F)
20°C
(68°F)
22°C
(72°F)
24°C
(75°F)
26°C
(79°F)
Microfine
100
12
1
/
2
10
8
1
/
2
7
5
3
/
4
Microfine (1:1)
**
100 -- 13
10
1
/
2
8
3
/
4
7
1
/
4
Super Prodol (SPD)
80
5
1
/
2
4
1
/
4
3
1
/
2
-- --
SPD (1:1)
**
80
7
3
/
4
6
1
/
2
5
1
/
2
4
1
/
2
3
3
/
4
(When using developers other than ours)
Unit: minutes
Developer
Temp.
EI
*
18°C
(64°F)
20°C
(68°F)
22°C
(72°F)
24°C
(75°F)
26°C
(79°F)
D-76
100
8
1
/
2
7
1
/
4
6
1
/
4
5
1
/
4
4
1
/
2
200 12 10
8
1
/
2
7 6
D-76 (1:1)
**
100 13
10
1
/
2
8
3
/
4
7
1
/
4
6
1
/
4
ID-11 100 8
6
3
/
4
5
3
/
4
4
3
/
4
4
When deep tanks are used, development times should be
extended by 5 to 10%, compared to those used with small
tanks.
* EI (Exposure Index) is the exposure determination designator and the
camera or exposure meter ISO speed should be set to this value.
** The (1:1) parenthesized ratio given in the foregoing table indicates that
one part water is to be added to one part developer.
(2) Stop Bath
For the stop bath a 1.5 % acetic acid solution is recommended.
Immerse the film in the bath at 15 to 25°C (59 to 77°F) for 20 to
30 seconds while agitating.
(3) Fixing
Fujifix Super-L is recommended for fixing. The recommended
fixing times at 15 to 25°C (59 to 77°F) are shown below. The
required fixing time is twice the time it takes for the film to be-
come clear. In order to maintain fixing uniformity and prevent
film staining, agitate the fixing solution continuously for the first
30 seconds.
Fixer
Type
Fixing Time (min.)
Fujifix Super-L
Acid hardening rapid
concentrated fixer
5 to 10
(4) Washing
Wash the film in running water for 20 to 30 minutes. The use of
Fuji QW (quick washing agent) is recommended when a shorter
washing time is desired or when the processed film shows a
slight reddish purple cast. When using Fuji QW, pre-wash the
film for about 30 seconds, immerse it in Fuji QW solution for 1
minute, and wash it in running water for 5 minutes. The required
wash water temperature is 15 to 25°C (59 to 77°F).
(5) Drying
After washing, wipe both sides of the film very carefully with a
soft sponge, then immerse it in a 1-to-200 solution of Fuji Driwel
for 30 seconds and hang it up for uniform drying. For natural
drying, hang the film in a well-ventilated dust free location.
To protect important negatives from oxidizing gases that cause
color fading, it is recommended that the film be treated with Fuji
Ag Guard. In this case, use Fuji Ag Guard instead of Fuji Driwel
in the procedure.
8
PROCESSING IN AUTOMATIC PROCESSORS
Development Conditions for Hanger-transport Type Processors
Developer
EI
Temperature
Time **
Minidol Fine
*
100
24°C (75°F)
8
3
/
4
min.
* Created by adding DP PAPINAL C-S (Starter) to Minidol Fine R
(Replenisher).
** Since the final processing results are affected by such factors as the
agitation and circulation conditions of the processor, it is recommended
that test prints be made in order to determine the proper development
time.
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9. PRINTER CONDITIONS
This film can be printed on the same printer setup with results
similar to NEOPAN 100 ACROS.
10. PROCESSED FILM STORAGE
Exposure to light, high temperature and humid conditions can
cause color changes in processed films. Therefore, place such
films in sleeves and store them in dark, dry, cool and well ven-
tilated locations under the following conditions.
Medium-term storage:
Below 25°C (77°F) at 30% to 50% RH
Long-term storage:
Below 10°C (50°F) at 30% to 50% RH
11.
DIFFUSE RMS GRANULARITY VALUE
DIFFUSE RMS GRANULARITY VALUE7
Processing: Microfine
Micro-densitometer Measurement Aperture: 48 µm in diameter.
Sample Density: 1.0 above minimum density
12. RESOLVING POWER
Processing: Microfine, 20°C (68°F), Small tank development
Chart Contrast 1.6 : 1 ············· 60 lines/mm
Chart Contrast 1000 : 1 ··········· 200 lines/mm
13. CHARACTERISTIC CURVES
14. SPECTRAL SENSITIVITY CURVE
15. TIME-G
-
CURVES
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The data herein published were derived from materials taken from general production runs.
However, changes in specifications may occur without
NOTICE
7-3, Akasaka 9-chome, Minato-ku, Tokyo 107-0052, Japan
Ref.No. AF3-0258E (20.02-BX)